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Effort to produce textured CeO2 and MgO films by the spray pyrolysis technique as buffer layers for coated conductors

机译:努力通过喷雾热解技术生产带纹理的CeO2和MgO膜作为涂层导体的缓冲层

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摘要

The possibility of using spray pyrolysis as a simple, chemical, low cost method for the production of CeO2 and MgO thin films widely used as buffer layers for second generation coated conductors was examined. CeO2 films were produced on borosilicate glass substrates and four different surface morphologies were observed at different deposition temperatures. The smoothest films were obtained when the process was described as low temperature chemical vapour deposition. In addition, c-axis textured CeO2 films have been deposited on Si (100) single crystal, but the surface morphology was quite rough, consisting of distinct particles indicating that further optimisation is needed. On the other hand c-axis textured MgO films with smooth morphologies were deposited on Si (100) single crystal. Rocking curves revealed an excellent out of plane texture with a FWHM between 0.950 and 1.010
机译:研究了使用喷雾热解法作为简单,化学,低成本的方法来生产广泛用作第二代涂层导体缓冲层的CeO2和MgO薄膜的方法。 CeO2薄膜是在硼硅酸盐玻璃基板上生产的,在不同的沉积温度下观察到四种不同的表面形态。当将该过程描述为低温化学气相沉积时,可获得最光滑的膜。此外,c轴织构的CeO2薄膜已沉积在Si(100)单晶上,但表面形态相当粗糙,由不同的颗粒组成,表明需要进一步优化。另一方面,具有平滑形态的c轴织构MgO膜沉积在Si(100)单晶上。摇摆曲线显示出出色的面外纹理,FWHM在0.950至1.010之间

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